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Scaling up of cluster beam deposition technology for catalysis application
Frontiers of Chemical Science and Engineering 2021, Volume 15, Issue 6, Pages 1360-1379 doi: 10.1007/s11705-021-2101-7
Keywords: nanoparticle cluster cluster beam deposition magnetron sputtering heterogeneous catalysis
Development of High-purity Metal Sputtering Targets for Integrated Circuits
He Jinjiang , Lyu Baoguo , Jia Qian , Ding Zhaochong , Liu Shuqin ,Luo Junfeng , Wang Xingquan
Strategic Study of CAE 2023, Volume 25, Issue 1, Pages 79-87 doi: 10.15302/J-SSCAE-2023.01.003
High-purity metal sputtering target is one of the key basic materialsSelf-dependence of the sputtering targets is vital for the high-quality development of the integratedThis study analyzes the application demand for and development status of high-purity metal sputteringchallenges regarding the key manufacturing technologies and engineering application of high-performance sputteringinternational exchange and cooperation,thereby promoting the development quality and level of high-purity metal sputtering
Keywords: high-purity metal sputtering target integrated circuit thin film metallization
Pascal Brault, William Chamorro-Coral, Sotheara Chuon, Amaël Caillard, Jean-Marc Bauchire, Stève Baranton, Christophe Coutanceau, Erik Neyts
Frontiers of Chemical Science and Engineering 2019, Volume 13, Issue 2, Pages 324-329 doi: 10.1007/s11705-019-1792-5
Keywords: molecular dynamics cluster growth plasma sputtering nanocatalyst
Wenhui Liang, Houbo Zhou, Jiefu Xiong, Fengxia Hu, Jia Li, Jian Zhang, Jing Wang, Jirong Sun, Baogen Shen
Engineering 2020, Volume 6, Issue 2, Pages 158-163 doi: 10.1016/j.eng.2019.11.010
Amorphous Sm–Co films with uniaxial in-plane anisotropy have great potential for application in informationstorage media and spintronic materials. The most effective method to produce uniaxial in-plane anisotropy is to apply an in-plane magnetic field during deposition. However, this method inevitably requires more complex equipment. Here, we report a new way to produce uniaxial in-plane anisotropy by growing amorphous Sm–Co films onto (011)-cut single-crystal substrates in the absence of an external magnetic field. The tunable anisotropy constant, kA, is demonstrated with variation in the lattice parameter of the substrates. A kA value as high as about 3.3 × 104 J·m−3 was obtained in the amorphous Sm–Co film grown on a LaAlO3(011) substrate. Detailed analysis indicated that the preferential seeding and growth of ferromagnetic (FM) domains caused by the anisotropic strain of the substrates, along with the formed Sm–Co, Co–Co directional pair ordering, exert a substantial effect. This work provides a new way to obtain in-plane anisotropy in amorphous Sm–Co films.
Keywords: Amorphous Sm–Co films In-plane uniaxial anisotropy Sputtering
sub>xIn1−x)2O3 layer grown by magnetron sputtering Research Articles
Fabi Zhang, Jinyu Sun, Haiou Li, Juan Zhou, Rong Wang, Tangyou Sun, Tao Fu, Gongli Xiao, Qi Li, Xingpeng Liu, Xiuyun Zhang, Daoyou Guo, Xianghu Wang, Zujun Qin,zhangfabi@outlook.com,qinzj@guet.edu.cn
Frontiers of Information Technology & Electronic Engineering 2021, Volume 22, Issue 10, Pages 1370-1378 doi: 10.1631/FITEE.2000330
Keywords: (GaxIn1−x)2O3薄膜;带隙可调谐;磁控溅射
Title Author Date Type Operation
Development of High-purity Metal Sputtering Targets for Integrated Circuits
He Jinjiang , Lyu Baoguo , Jia Qian , Ding Zhaochong , Liu Shuqin ,Luo Junfeng , Wang Xingquan
Journal Article
Molecular dynamics simulations of initial Pd and PdO nanocluster growth in a magnetron gas aggregation source
Pascal Brault, William Chamorro-Coral, Sotheara Chuon, Amaël Caillard, Jean-Marc Bauchire, Stève Baranton, Christophe Coutanceau, Erik Neyts
Journal Article
Tunable In-Plane Anisotropy in Amorphous Sm–Co Films Grown on (011)- Oriented Single-Crystal Substrates
Wenhui Liang, Houbo Zhou, Jiefu Xiong, Fengxia Hu, Jia Li, Jian Zhang, Jing Wang, Jirong Sun, Baogen Shen
Journal Article